March 21-22,2023 | Dresden, Germany
Stephan Wege is going to present plasway-technologies GmbH especially the FALP® - tool at EFDS Conference under the topic: ALE (Atomic Layer Etch) and PEALD (Plasma Enhanced Atomic Layer Deposition) in one Chamber (FALP) with high throughput.
If this is of interest to you, we would be happy to have you join us for this event.